- All sections
- G - Physics
- G01N - Investigating or analysing materials by determining their chemical or physical properties
- G01N 23/2206 - Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
Patent holdings for IPC class G01N 23/2206
Total number of patents in this class: 99
10-year publication summary
|
1
|
1
|
5
|
6
|
12
|
14
|
14
|
14
|
26
|
4
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Canon Anelva Corporation | 676 |
8 |
| FEI Company | 851 |
8 |
| ASML Netherlands B.V. | 6816 |
4 |
| Applied Materials Israel, Ltd. | 549 |
3 |
| Bruker Nano GmbH | 63 |
3 |
| Orexplore AB | 27 |
3 |
| Shanghai United Imaging Healthcare Co., Ltd. | 1569 |
3 |
| OTR Wheel Safety, Inc. | 4 |
3 |
| Hitachi High-Tech Corporation | 4424 |
3 |
| Enersoft Inc. | 28 |
2 |
| HORIBA, Ltd. | 746 |
2 |
| Advanced Manufacturing LLC | 3 |
2 |
| Mantex IP AB | 13 |
2 |
| Schlumberger Technology Corporation | 9690 |
1 |
| Halliburton Energy Services, Inc. | 20165 |
1 |
| LG Chem, Ltd. | 17205 |
1 |
| Mitsubishi Heavy Industries, Ltd. | 8217 |
1 |
| Sumitomo Electric Industries, Ltd. | 14131 |
1 |
| Hewlett-Packard Development Company, L.P. | 28538 |
1 |
| Hitachi, Ltd. | 16452 |
1 |
| Other owners | 46 |